Perlast Case Studies
Perlast materials are proven to provide superior sealing solutions in a number of industries and applications.
Case #S0018 - Perlast® G67P increased PM cycle by 366%
Sealing a chamber using all Perlast® G67P seals in a leading high temperature microwave photo resist removal tool, extended PM cycles from 6k wafers to 22k wafers. This was achieved through a combination of reduced particle generation, improved resistance to process gases, improved plasma compatibility and lower permeation over the incumbent sealing material.
Case #S0024 - KIMURA™ K13X reduced downtime by 66%
KIMURA™ K13X seals were fitted to a turbo pump gate valve in a Poly Etch process (Cl2, HBr environment at 175°C) for a US Fab after they experienced leaks and particulation due to seal erosion. The KIMURA™ seals reduced downtime by extending PM cycles from 45k wafers to 75k wafers.
Case #S0044 - Perlast® G67P increased die yield by 100%
Sealing a chamber using all Perlast® G67P seals in a HDP-CVD process (SiF4, SiH4, NF3, O2 environment at 175°C, NF3 direct RF cleaning) extended PM cycles from 10k wafers to 20k wafers. The incumbent white FFKM material was experiencing cracking, resulting in severe particulation and a significant reduction in yield.
Case #S0048 - Perlast® G67P eliminates particulation
A white FFKM material used in a MESC flange in a HDP-CVD-Nanofill process ( SiH4, NF3, H2, O2 environment at 180°C, NF3 remote plasma cleaning) was causing particulation and a reduction in die yield as a result of the seal cracking at the corners after 7.5k wafers. The incumbent material was replaced by Perlast® G67P and no cracking whatsoever was observed after 7.5k wafers.
Case #S0051 - Perlast® G67P extended PM cycle x2
A USA Fab using Perlast® G67P seals throughout the chamber in a CF4, N2, H2, O2 Ash/Strip environment at 250°C achieved an increase in PM cycle from 90k wafers to 180k wafers. The incumbent material was experiencing erosion causing particulation. On removal, a visual inspection of the Perlast seals showed no degradation had occurred and a particle count demonstrated that particulation had been eliminated.
Case #S0119 - Perlast® G67P on MONOVAT® achieved x3 increase in wafer yield
A major semiconductor manufacturer was experiencing problems with contamination and poor wafer yield in a Low-K CVD process on a Producer® tool. The dynamic MONOVAT® gates were fitted with a traditional white FFKM material and the gates had to be replaced every 15,000-30,000 wafers.
Since using MONOVAT® gates fitted with Perlast® G67P, this chip producer achieves over 90,000 wafers, which represents a considerable cost saving. This reflects the ultra-pure material composition, superior chemical resistance and outstanding mechanical properties of Perlast materials.
Registered trade marks: MONOVAT® - VAT Vakuumventile AG, Producer® - AMAT
Case #S0141 - Perlast® G67P reduced lost production from 14% to 0%
A full chamber of Perlast® G67P seals in a 200mm photo resist process strip/asher, fitted with a steam module, was compared with the incumbent competitor FFKM material. The number of particles greater than 0.2µm deposited on the wafers was measured over a period of 9 months. The incumbent seal material produced 0-20 particles per wafer 70% of the time, with over 50 particles per wafer 14% of the time. 50+ particles was considered out of specification and the wafers rejected, this equated to 38 days lost production. As a result the competitor seals were changed more often to reduce the amount of lost yield.
The chamber fitted with Perlast® G67P seals experienced less than 20 particles 95% of the time, with no wafers falling outside the 50 particle limit and therefore no loss in production. in addition the Perlast seals did not need to be changed as often, thereby reducing the cost of ownership and increasing maintenance intervals.
Case #P0056 - Precision Perlast seals for high containment ChargePoint valves - download (PDF)
Case #B0173 - Perlast micro seals for Upchurch ‘Lab-on-a-Chip’ analysis applications - download (PDF)
Case #C0012 - Perlast extends maintenance cycles by 40% in new Thermo Vacuum Generators Valves and Actuators - download (PDF)
More case studies will be added shortly.
