Perlast® G100XT

Perlast® G100XT is a highly reinforced perfluoroelastomer, combining extremely high purity with excellent mechnical properties. Developed for use in advanced wet and dry semiconductor processes with very small feature sizes, this material provides ultra-low out-gassing properties, high temperature stability and excellent plasma resistance.

Perlast® G100XT combines a fully fluorinated polymer backbone with and a highly fluorinated cross-linking system to provide a material with exceptional resistance to high temperature and aggressive semiconductor processes such as ALD, PVD, CVD, Etch, Stripping and Cleaning.

Perlast® G100XT has a low compressive modulus making it highly compliant. So for a given compression, it exhibits a low reaction force, this results in lower stress on the seal, which leads to longer life expectancy.

Key attributes:

  • Exceptionally pure to minimize particulation
  • High temperature stability
  • Exceptionally low compression set
  • Excellent mechanical properties
  • Ultra-low outgassing, ideal for vacuum
  • High sealing efficiency
  • Reduced cost of ownership


 

 
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